发明名称 Method of producing a layer of cavities
摘要 A method of producing a layer of cavities in a structure comprises at least one substrate formed from a material that can be oxidized or nitrided, the method comprising the following steps: implanting ions into the substrate in order to form an implanted ion concentration zone at a predetermined mean depth; heat treating the implanted substrate to form a layer of cavities at the implanted ion concentration zone; and forming an insulating layer in the substrate by thermochemical treatment from one surface of the substrate, the insulating layer that is formed extending at least partially into the layer of cavities.
申请公布号 US8614501(B2) 申请公布日期 2013.12.24
申请号 US201013143038 申请日期 2010.02.01
申请人 LANDRU DIDIER;SOITEC 发明人 LANDRU DIDIER
分类号 H01L27/12;H01L21/31 主分类号 H01L27/12
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