| 摘要 |
The invention relates to a device for thermally treating a wet substrate to increase the dry substrate content of said wet substrate. Said device comprises at least one centrifugal shaft (f, a1) which is arranged in a housing and on which means for the fragmented conveyance of the wet substrate in a drying chamber of the device are arranged. Said device comprises an inlet for the web substrate (e, h1) and an outlet for the at least partially moisture-reduced substrate (g, il) and the drying chamber comprises an inlet (m, j1) and an outlet (k1) for the drying air and is designed for inputting thermal energy. The substrate outlet of said device is designed to control the amount of the at least partially moisture-reduced substrate present in the drying chamber. |
