| 摘要 |
Disclosed is a dry cleaning method for removing a composition represented by a compositional formula of MgaZnbOHc (0@a@1, 0@b@1, 0@c@1, and 0.5@a+b@1), which accumulates in a film formation chamber or in an exhaust pipe of an apparatus for forming a composition represented by a compositional formula of MgXZn1-XO (0@x@1) into a film, by using a cleaning gas. This method is characterized by that a cleaning gas containing beta-diketone is used and that the composition is removed by reacting the composition accumulated with the cleaning gas at a temperature of from 100° C. to 400° C. It is possible by this method to remove the composition without opening the apparatus. |
