Method for preparing electromagnetic wave-diffracting structure of wavefront source, involves applying beam of charged or uncharged particles on substrate, and removing material of basic structure on substrate

摘要

The method involves forming (101) a basic structure on a substrate. The beam of charged or uncharged particles is applied (103) on the basic structure of the substrate. The material of the basic structure on the substrate is removed (105). The diffracting structure is formed (107). The charged particles are selected from the group of electrons, protons or ions. The uncharged particles are selected from atoms or molecules.