发明名称
摘要 A semiconductor transistor device includes one or more conductive base regions, a first semiconductor barrier region, a second semiconductor barrier region, a conductive emitter region, and a conductive collector region. The first semiconductor barrier region or the second semiconductor barrier region has a dimension smaller than 100 Å. A first Schottky barrier junction is formed at the interface of the first semiconductor barrier region and the one or more conductive base regions. A second Schottky barrier junction is formed at the interface of the second semiconductor barrier region and the one or more conductive base regions. A third Schottky barrier junction is formed at the interface of the conductive emitter region and the first semiconductor barrier region. A fourth Schottky barrier junction is formed at the interface of the conductive collector region and the second semiconductor barrier region.
申请公布号 JP5368252(B2) 申请公布日期 2013.12.18
申请号 JP20090245103 申请日期 2009.10.26
申请人 发明人
分类号 H01L21/331;H01L21/28;H01L29/417;H01L29/73 主分类号 H01L21/331
代理机构 代理人
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