发明名称 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, FLUID SUPPLYING METHOD AND STORAGE MEDIUM
摘要 The present invention relates to a substrate processing apparatus, a substrate processing method, a fluid supplying method and a storage medium. According to the present invention, the substrate processing apparatus processes a container treating a substrate; a fluid supplying source; a static pressure supplying the flow path; a boosting pressure supplying the flow path; and a control unit changing the boosting pressure supplying the flow path.
申请公布号 KR20130138122(A) 申请公布日期 2013.12.18
申请号 KR20130064214 申请日期 2013.06.04
申请人 TOKYO ELECTRON LIMITED 发明人 GOSHI GENTARO;MITSUOKA KAZUYUKI;YOU GEN;OHNO HIROKI;ORII TAKEHIKO;TOSHIMA TAKAYUKI
分类号 H01L21/302 主分类号 H01L21/302
代理机构 代理人
主权项
地址