发明名称 Static timing analysis method and system considering capacitive coupling and double patterning mask misalignment
摘要 A method for analyzing an IC design, comprises: using a computer implemented electronic design automation tool to perform a parasitic RC extraction for a layout of the IC design, the parasitic RC extraction outputting for each of a plurality of routing paths, a nominal capacitive coupling, a minimum capacitive coupling and a maximum capacitive coupling, where the minimum and maximum capacitive couplings correspond to circuit patterning in the presence of double patterning mask misalignments; and performing one of a setup time analysis or a hold time analysis of the IC design using a computer implemented static timing analysis tool. For a given flip-flop having a launch path and a capture path, the setup or hold time analysis is performed using the minimum capacitive coupling for one of the launch and capture paths and the maximum capacitive coupling for the other of the launch and capture paths.
申请公布号 US8612912(B1) 申请公布日期 2013.12.17
申请号 US201213723248 申请日期 2012.12.21
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHEN WEN-HAO;CHENG YI-KAN
分类号 G06F17/50 主分类号 G06F17/50
代理机构 代理人
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