| 摘要 |
<p>An aluminum metal wire manufacturing method comprises an adhesive-layer deposition process, an aluminum-metal-layer deposition process, an antireflection-film deposition process, an aluminum-metal-wire etching process, and a dielectric layer deposition process. The adhesive-layer deposition process comprises: depositing a titanium layer on a substrate through a metal ionizing process, and applying a direction control electric field to a deposited surface during the deposition to make deposition directions of grains of the titanium layer consistent. The dielectric layer deposition process uses a staged plasma-enhanced process. The deposition density and direction of the titanium layer are improved, so as to decrease the deposition stress of the dielectric layer, thereby improving the shaping quality of the aluminum metal wire.</p> |
