SUBSTRATE LOADING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a substrate loading apparatus configured to suppress deformation due to film deposition.SOLUTION: A substrate loading apparatus is configured to load thereon a substrate as a film formation processing object and be stored in a film formation apparatus. The substrate loading apparatus incudes a loading surface defining a loading region configured to load the substrate thereon. An uneven structure is defined on a surface of a deposition region as being at least a residual region of the loading region on the loading surface so that a film deposited on the deposition region is not continuously adhered to the loading surface over the entire surface of the deposition region.