发明名称 |
HEAT TREATMENT DEVICE, COOLING METHOD OF HEAT TREATMENT PLATE, PROGRAM, AND COMPUTER STORAGE MEDIUM |
摘要 |
PROBLEM TO BE SOLVED: To promptly lower a temperature of a heat treatment plate.SOLUTION: A heat treatment device is used for placing a wafer W on a heat treatment plate 50 and performing heat treatment and includes: a second cooling plate 62 which contacts or moves close to the heat treatment plate 50 thereby being used for cooling the heat treatment plate 50; a first cooling plate 61 for cooling the second cooling plate 62; and a cooling plate lifting mechanism 60 for relatively moving the second cooling plate 62 between a standby position for cooling the second cooling plate 62 by the first cooling plate 61 and a cooling position for cooling the heat treatment plate 50. An elastic member 95 is provided between the second cooling plate 62 and the cooling plate lifting mechanism 60. |
申请公布号 |
JP2013251329(A) |
申请公布日期 |
2013.12.12 |
申请号 |
JP20120123341 |
申请日期 |
2012.05.30 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
MIZUNAGA KOICHI;TOYOSAWA SODAI;OSHIMA KAZUHIKO |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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