发明名称 HEAT TREATMENT DEVICE, COOLING METHOD OF HEAT TREATMENT PLATE, PROGRAM, AND COMPUTER STORAGE MEDIUM
摘要 PROBLEM TO BE SOLVED: To promptly lower a temperature of a heat treatment plate.SOLUTION: A heat treatment device is used for placing a wafer W on a heat treatment plate 50 and performing heat treatment and includes: a second cooling plate 62 which contacts or moves close to the heat treatment plate 50 thereby being used for cooling the heat treatment plate 50; a first cooling plate 61 for cooling the second cooling plate 62; and a cooling plate lifting mechanism 60 for relatively moving the second cooling plate 62 between a standby position for cooling the second cooling plate 62 by the first cooling plate 61 and a cooling position for cooling the heat treatment plate 50. An elastic member 95 is provided between the second cooling plate 62 and the cooling plate lifting mechanism 60.
申请公布号 JP2013251329(A) 申请公布日期 2013.12.12
申请号 JP20120123341 申请日期 2012.05.30
申请人 TOKYO ELECTRON LTD 发明人 MIZUNAGA KOICHI;TOYOSAWA SODAI;OSHIMA KAZUHIKO
分类号 H01L21/027 主分类号 H01L21/027
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