ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND PATTERN-FORMATION METHOD USING SAME

摘要

The active light-sensitive or radiation-sensitive resin composition of the present invention contains: (A) at least one compound expressed by general formula (I) for generating an acid through irradiation by active light rays or radiation; and (B) at least one resin containing a repeating unit expressed by general formula (1), the resin becoming more soluble in an alkali developer by decomposing through the action of the acid.