发明名称 |
Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent |
摘要 |
<p>A surface-treating agent for forming a resist pattern, includes: a compound represented by formula (1) as defined in the specification, wherein the surface-treating agent is used in a step between a formation of a first resist pattern on a first resist film and a formation of a second resist film on the first resist pattern to form a second resist pattern, and a pattern-forming method uses the surface-treating agent.</p> |
申请公布号 |
EP1975718(A3) |
申请公布日期 |
2013.12.11 |
申请号 |
EP20080005508 |
申请日期 |
2008.03.25 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
HOSHINO, WATARU;TSUBAKI, HIDEAKI;YOSHIDOME, MASAHIRO |
分类号 |
G03F7/11;G03F7/00;G03F7/20;G03F7/40 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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