发明名称 DIRECTED MULTI-DEFLECTED ION BEAM MILLING OF A WORK PIECE AND DETERMINING AND CONTROLLING EXTENT THEREOF
摘要 Method, device, and system, for directed multi-deflected ion beam milling of a work piece, and, determining and controlling extent thereof. Providing an ion beam; and directing and at least twice deflecting the provided ion beam, for forming a directed multi-deflected ion beam, wherein the directed multi-deflected ion beam is directed towards, incident and impinges upon, and mills, a surface of the work piece. Device includes an ion beam source assembly; and an ion beam directing and multi-deflecting assembly, for directing and at least twice deflecting the provided ion beam, for forming a directed multi-deflected ion beam, wherein the directed multi-deflected ion beam is directed towards, incident and impinges upon, and mills, a surface of the work piece.
申请公布号 KR20130135320(A) 申请公布日期 2013.12.10
申请号 KR20137024937 申请日期 2005.08.24
申请人 SELA SEMICONDUCTOR ENGINEERING LABORATORIES LTD. 发明人 BOGUSLAVSKY DIMITRI;CHEREPIN VALENTIN;SMITH COLIN
分类号 H01J37/147;H01J37/08 主分类号 H01J37/147
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