| 摘要 |
Disclosed is an optical element to be subjected to a reflow process at high temperatures, wherein cracks or wrinkles can be prevented from occurring in an antireflection film. A method for producing the optical element, and a method for manufacturing an electronic device using the optical element are also disclosed. Specifically disclosed is a method for producing an optical element comprising a base, wherein at least one optical surface is composed of a resin material, and a coating formed on the optical surface of the base and composed of an inorganic material, the optical element being mounted on a substrate together with an electronic component by a reflow process at a temperature Ta. The method is characterized in that the coating is formed at a film-forming temperature Tb of not less than (Ta-60� C.), and a material having a glass transition temperature of not less than 290� C. or a glass transition temperature of not less than (Tb-50� C.) is used as the resin material. |
