发明名称 METHOD OF FORMING AN ACTIVE PATTERN, DISPLAY SUBSTRATE BEING FORMED USING THE SAME AND METHOD OF MANUFACTURING THE DISPLAY SUBSTRATE
摘要 <p>The present invention relates to a forming method of active patterns comprising the following steps: forming a gate metal layer on a base substrate; forming gate lines and gate patterns placed apart from the gate lines by patterning the gate metal layer; forming a first interface corresponding to an area in which the gate patterns are formed by coating insulating layer on the base substrate o which gate lines and patters are formed; forming a second interface corresponding to the first substrate by forming a semiconductor layer on the base substrate on which the gate insulating layer is formed; and crystalizing the semiconductor layer on the second interface with laser beams. By forming active patterns through the gate patterns and laser crystallization methods, manufacturing process can be simplified, and manufacturing costs can be reduced while producing active patterns of high quality on a desirable spot.</p>
申请公布号 KR20130134100(A) 申请公布日期 2013.12.10
申请号 KR20120057373 申请日期 2012.05.30
申请人 SAMSUNG DISPLAY CO., LTD. 发明人 IM, WAN SOON;SONG, YOUNG GOO;JUNG, HWA DONG
分类号 H01L29/786;H01L21/336 主分类号 H01L29/786
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