| 摘要 |
PURPOSE: An apparatus for forming an anodized film using a plasma electrolytic oxidation method and ultrasonic waves are provided to obtain anodized films with a desired thickness in a short time because the oxidation reaction of the surface of metallic materials is promoted by receiving uniform ultrasonic energy. CONSTITUTION: An apparatus for forming an anodized film using a plasma electrolytic oxidation method and ultrasonic waves comprises an electrolytic bath(10), a holder(20), an inert metal(40), a power part, and an ultrasonic device(60). The electrolytic bath accommodates an electrolyte. The holder is fixed to make the one side of a metal material dipped in the electrolyte face the bottom surface of the electrolytic bath. The inert metal is separately arranged from the metal material in the electrolytic bath. The power part applies a voltage to the metal material and the inert metal. The ultrasonic device applies ultrasonic waves to the other side of the metal material. |
