发明名称 |
Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system |
摘要 |
A method of controlling particle absorption on a wafer sample and charged particle beam imaging system thereof prevents particle absorption by grounding the wafer sample and kept electrically neutral during the transfer-in and transfer-out process. |
申请公布号 |
US8604428(B2) |
申请公布日期 |
2013.12.10 |
申请号 |
US201113236108 |
申请日期 |
2011.09.19 |
申请人 |
WANG YOU-JIN;PAN CHUNG-SHIH;HERMES MICROVISION, INC. |
发明人 |
WANG YOU-JIN;PAN CHUNG-SHIH |
分类号 |
H01J37/26 |
主分类号 |
H01J37/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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