发明名称 |
Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method |
摘要 |
A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed. |
申请公布号 |
US8603733(B2) |
申请公布日期 |
2013.12.10 |
申请号 |
US201113196530 |
申请日期 |
2011.08.02 |
申请人 |
TARUTANI SHINJI;TSUBAKI HIDEAKI;MIZUTANI KAZUYOSHI;WADA KENJI;HOSHINO WATARU;FUJIFILM CORPORATION |
发明人 |
TARUTANI SHINJI;TSUBAKI HIDEAKI;MIZUTANI KAZUYOSHI;WADA KENJI;HOSHINO WATARU |
分类号 |
G03F7/00;G03F7/004;G03F7/20;G03F7/32 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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