发明名称 CHARGED PARTICLE BEAM DEVICE AND SAMPLE PREPARATION METHOD
摘要 PROBLEM TO BE SOLVED: To solve problems which happen, when performing an impression marking on the periphery of a defect: when a film thickness of the outermost surface film of a sample is thin, its periphery is split to generate a foreign object or to view the defect with difficulty; and when an impression is impressed small not to split the periphery, the impression is too small to be viewed.SOLUTION: A marking suitable for a film thickness is performed by changing conditions of an impression marking such as a load and a depth of an indenter and the like on the basis of a film thickness measurement result measured by a film thickness meter. If a film thickness is thin and accordingly the size of an impression is made to be small and therefore the impression is viewed with difficulty, the number of impressions is increased to improve visibility.
申请公布号 JP2013246001(A) 申请公布日期 2013.12.09
申请号 JP20120118780 申请日期 2012.05.24
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 TAMORI TOMOHIRO;ENDO FUMIAKI
分类号 G01N1/28;H01J37/28 主分类号 G01N1/28
代理机构 代理人
主权项
地址