发明名称 SUBSTRATE HOLDING DEVICE, EXPOSURE DEVICE AND DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate holding device enabling detection of a mark provided on the rear surface of a substrate using a position detection system installed on the surface side of the substrate, for example, such as a wafer.SOLUTION: A substrate holding device having the rear surface of a substrate includes: a substrate holding member having a contact part in contact with the rear surface of the substrate; a first optical system which illuminates a mark provided on the rear surface of the substrate with light from a light source; and a second optical system which guides reflection light from the mark to the surface side of the substrate holding member and forms a spatial image of the mark. The first optical system and the second optical system are housed in the inside of the substrate holding member.
申请公布号 JP2013247304(A) 申请公布日期 2013.12.09
申请号 JP20120121452 申请日期 2012.05.29
申请人 NIKON TEC CORP 发明人 OZAWA HARUO;YAMAMOTO KENGO;HANZAWA TATSUO;KADOIKE HIROAKI
分类号 H01L21/027;G03F9/00 主分类号 H01L21/027
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