发明名称 EVAPORATIVE SYSTEMS AND METHODS FOR DAMPENING FLUID CONTROL IN A DIGITAL LITHOGRAPHIC SYSTEM.
摘要 A system and corresponding methods are disclosed for controlling the thickness of a layer of dampening fluid applied to a reimageable surface of an imaging member in a variable data lithography system. Following deposition of the dampening fluid layer, a gas is passed over a region of the fluid layer prior to pattern forming. The gas causes a controlled amount of the dampening fluid layer to evaporate such that the remaining layer is of a desired and controlled thickness. Among other advantages, improved print quality is obtained.
申请公布号 MX2013002791(A) 申请公布日期 2013.12.05
申请号 MX20130002791 申请日期 2013.03.12
申请人 XEROX CORPORATION.* 发明人 CHU-HENG LIU;PETER KNAUSDORF
分类号 B41C1/10 主分类号 B41C1/10
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