| 摘要 |
PROBLEM TO BE SOLVED: To provide a photocatalyst structure restrained from the formation of scratches.SOLUTION: A photocatalyst structure including a resin base material, a primary coat layer and a photocatalyst layer includes the primary coat layer and the photocatalyst layer in this order on at least one surface of the resin base material, wherein a photocatalyst layer surface has rugged shape with an arithmetic average roughness (Ra) specified by a Japanese Industrial Standard JIS B0601:1994 being 0.6 μm or more, and the photocatalyst layer contains tungsten oxide particles. |
