发明名称 CMOS Image Sensors and Methods for Forming the Same
摘要 A device includes a diode, which includes a first, a second, and a third doped region in a semiconductor substrate. The first doped region is of a first conductivity type, and has a first impurity concentration. The second doped region is of the first conductivity type, and has a second impurity concentration lower than the first impurity concentration. The second doped region encircles the first doped region. The third doped region is of a second conductivity type opposite the first conductivity type, wherein the third doped region overlaps a portion of the first doped region and a portion of the second doped region.
申请公布号 US2013320420(A1) 申请公布日期 2013.12.05
申请号 US201213615071 申请日期 2012.09.13
申请人 KAO MIN-FENG;YAUNG DUN-NIAN;LIU JEN-CHENG;CHUANG CHUN-CHIEH;TSENG HSIAO-HUI;HSU TZU-HSUAN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 KAO MIN-FENG;YAUNG DUN-NIAN;LIU JEN-CHENG;CHUANG CHUN-CHIEH;TSENG HSIAO-HUI;HSU TZU-HSUAN
分类号 H01L31/02;H01L31/18 主分类号 H01L31/02
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