发明名称 GAS DISCHARGE CHAMBER
摘要 A gas discharge chamber that uses a calcium fluoride crystal which reduces a breakage due to mechanical stress (window holder and laser gas pressure), thermal stress from light absorption, and the like, increases the degree of linear polarization of output laser, and suppresses degradation due to strong ultraviolet (ArF, in particular) laser light irradiation. A first window (2) and a second window (3) of the gas discharge chamber have an incident plane and an emitting plane in parallel with a (111) crystal plane of their calcium fluoride crystal. With respect to an arrangement where laser light entering the calcium fluoride crystal passes through a plane including a <111> axis and a <001> axis of each of the first window (2) and the second window (3) as seen from inside the chamber (1), the first window (2) and the second window (3) are arranged in positions rotated in the same direction by the same angle about their <111> axis.
申请公布号 US2013322483(A1) 申请公布日期 2013.12.05
申请号 US201313931840 申请日期 2013.06.29
申请人 GIGAPHOTON INC. 发明人 NAGAI SHINJI;YOSHIDA FUMIKA;WAKABAYASHI OSAMU;KAKIZAKI KOUJI
分类号 H01S3/034 主分类号 H01S3/034
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