发明名称 SUBSTRATE TREATMENT DEVICE, TEMPERATURE MEASUREMENT SYSTEM, METHOD FOR MEASURING TEMPERATURE OF TREATMENT DEVICE, TRANSPORTATION DEVICE, AND MEMORY MEDIUM
摘要 <p>In order to improve the workability of measuring the temperature soaking region in the treatment furnace and improve the reliability of the soaking length of the heater, this invention provides a substrate treatment device having: a treatment chamber for treating a substrate loaded in a state of being held by a holding tool; a temperature measuring instrument for measuring the temperature in the treatment chamber; a transportation device for transporting the substrate at least to the holding tool; and a controller for moving the transportation device to a preset position before the temperature in the treatment chamber is measured, and acquiring the temperature from the temperature measuring instrument while raising/lowering the transportation device in a state in which the temperature measuring instrument is attached when the temperature in the treatment chamber is measured.</p>
申请公布号 WO2013180010(A1) 申请公布日期 2013.12.05
申请号 WO2013JP64380 申请日期 2013.05.23
申请人 HITACHI KOKUSAI ELECTRIC INC. 发明人 WATANABE, AKIHITO;MIYASHITA, NAOYA;TAKASHIMA, KATSUMI;HONDA, SHIGERU
分类号 H01L21/31;H01L21/22;H01L21/677 主分类号 H01L21/31
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