发明名称 |
SUBSTRATE TREATMENT DEVICE, TEMPERATURE MEASUREMENT SYSTEM, METHOD FOR MEASURING TEMPERATURE OF TREATMENT DEVICE, TRANSPORTATION DEVICE, AND MEMORY MEDIUM |
摘要 |
<p>In order to improve the workability of measuring the temperature soaking region in the treatment furnace and improve the reliability of the soaking length of the heater, this invention provides a substrate treatment device having: a treatment chamber for treating a substrate loaded in a state of being held by a holding tool; a temperature measuring instrument for measuring the temperature in the treatment chamber; a transportation device for transporting the substrate at least to the holding tool; and a controller for moving the transportation device to a preset position before the temperature in the treatment chamber is measured, and acquiring the temperature from the temperature measuring instrument while raising/lowering the transportation device in a state in which the temperature measuring instrument is attached when the temperature in the treatment chamber is measured.</p> |
申请公布号 |
WO2013180010(A1) |
申请公布日期 |
2013.12.05 |
申请号 |
WO2013JP64380 |
申请日期 |
2013.05.23 |
申请人 |
HITACHI KOKUSAI ELECTRIC INC. |
发明人 |
WATANABE, AKIHITO;MIYASHITA, NAOYA;TAKASHIMA, KATSUMI;HONDA, SHIGERU |
分类号 |
H01L21/31;H01L21/22;H01L21/677 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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