| 摘要 |
PROBLEM TO BE SOLVED: To provide a developing apparatus in which a developing liquid nozzle can be cleaned.SOLUTION: A slit nozzle 61 is moved relatively, by means of a nozzle lift mechanism 62 and a nozzle slide mechanism 63, to a substrate W which is held substantially horizontally by means of a spin chuck 11. The substrate W is developed with a developer being discharged from the discharge port 61e of the slit nozzle 61 onto the substrate W. After the developer is discharged, the slit nozzle 61 is moved to a standby position excepting above the substrate W held by means of a spin chuck 11. In a standby pot 70 provided at the standby position, the slit nozzle 61 is cleaned with a cleaning liquid mixed with bubbles. |
