发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 A semiconductor device includes a substrate, a conductive material, and a material layer. The substrate includes a through hole. The conductive material fills the through hole. The material layer is formed in the conductive material, wherein an electrical resistance of the conductive material is lower than an electrical resistance of the material layer.
申请公布号 US2013320540(A1) 申请公布日期 2013.12.05
申请号 US201213488208 申请日期 2012.06.04
申请人 CHIU YU SHAN;LIANG WEN PING;NANYA TECHNOLOGY CORPORATION 发明人 CHIU YU SHAN;LIANG WEN PING
分类号 H01L23/48;H01L21/768 主分类号 H01L23/48
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