发明名称 |
VAPOR DEPOSITION DEVICE, VAPOR DEPOSITION METHOD, AND ORGANIC EL DISPLAY DEVICE |
摘要 |
Vapor deposition particles (91) discharged from at least one vapor deposition source opening (61) pass through a plurality of limiting openings (82) of a limiting unit (80) and a plurality of mask openings (71) of a vapor deposition mask (70), and adhere to a substrate (10) that relatively moves along a second direction (10a) so as to form a coating film. The limiting unit includes a plurality of plate members stacked on one another. Accordingly, it is possible to efficiently form a vapor deposition coating film in which edge blurring is suppressed on a large-sized substrate at a low cost. |
申请公布号 |
US2013323881(A1) |
申请公布日期 |
2013.12.05 |
申请号 |
US201213984283 |
申请日期 |
2012.03.02 |
申请人 |
SONODA TOHRU;KAWATO SHINICHI;INOUE SATOSHI;HASHIMOTO SATOSHI;SHARP KABUSHIKI KAISHA |
发明人 |
SONODA TOHRU;KAWATO SHINICHI;INOUE SATOSHI;HASHIMOTO SATOSHI |
分类号 |
H01L51/50;H01L51/56 |
主分类号 |
H01L51/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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