发明名称 VAPOR DEPOSITION DEVICE, VAPOR DEPOSITION METHOD, AND ORGANIC EL DISPLAY DEVICE
摘要 Vapor deposition particles (91) discharged from at least one vapor deposition source opening (61) pass through a plurality of limiting openings (82) of a limiting unit (80) and a plurality of mask openings (71) of a vapor deposition mask (70), and adhere to a substrate (10) that relatively moves along a second direction (10a) so as to form a coating film. The limiting unit includes a plurality of plate members stacked on one another. Accordingly, it is possible to efficiently form a vapor deposition coating film in which edge blurring is suppressed on a large-sized substrate at a low cost.
申请公布号 US2013323881(A1) 申请公布日期 2013.12.05
申请号 US201213984283 申请日期 2012.03.02
申请人 SONODA TOHRU;KAWATO SHINICHI;INOUE SATOSHI;HASHIMOTO SATOSHI;SHARP KABUSHIKI KAISHA 发明人 SONODA TOHRU;KAWATO SHINICHI;INOUE SATOSHI;HASHIMOTO SATOSHI
分类号 H01L51/50;H01L51/56 主分类号 H01L51/50
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