PATTERN MEASUREMENT APPARATUS, PATTERN MEASUREMENT METHOD AND PATTERN MEASUREMENT PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide a technology capable of appropriately selecting and measuring a pattern contour of a measuring object even in a case where contours of patterns approximate with each other, in a sample including a plurality of patterns on the substantially same surface.SOLUTION: A pattern measurement apparatus scans a sample with electric charge particles, creates a detection image by detecting secondary electric charge particles or reflection electric charge particles generated from the sample, and measures a pattern imaged in the detection image. The pattern measurement apparatus includes: an image acquisition unit for acquiring a plurality of detection images that are in the substantially same place of the sample and whose imaging conditions are different from each other; a contour extraction unit for extracting a plurality of pattern contours from the detection images; a contour reconstruction unit for reconstructing a contour of a measuring object by combining the pattern contours; and a contour measurement unit for performing measurement with the reconstructed contour of the measuring object.