发明名称 |
THIN FILM FORMING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of detecting the position of a substrate in a short time.SOLUTION: A substrate provided with an object to be detected is held on a holding surface of a stage. A detection device is installed in the stage. The detection device detects the position of the object to be detected of the substrate held on the holding surface. Droplets of a thin film material are discharged from a plurality of nozzle holes formed in a nozzle unit to a surface of the substrate held on the holding surface of the stage. |
申请公布号 |
JP2013243240(A) |
申请公布日期 |
2013.12.05 |
申请号 |
JP20120115257 |
申请日期 |
2012.05.21 |
申请人 |
SUMITOMO HEAVY IND LTD |
发明人 |
OKAMOTO YUJI;NISHIMAKI JUN |
分类号 |
H05K3/10;B05C5/00;B05C11/00;H01L21/027;H05K3/00 |
主分类号 |
H05K3/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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