发明名称 THIN FILM FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of detecting the position of a substrate in a short time.SOLUTION: A substrate provided with an object to be detected is held on a holding surface of a stage. A detection device is installed in the stage. The detection device detects the position of the object to be detected of the substrate held on the holding surface. Droplets of a thin film material are discharged from a plurality of nozzle holes formed in a nozzle unit to a surface of the substrate held on the holding surface of the stage.
申请公布号 JP2013243240(A) 申请公布日期 2013.12.05
申请号 JP20120115257 申请日期 2012.05.21
申请人 SUMITOMO HEAVY IND LTD 发明人 OKAMOTO YUJI;NISHIMAKI JUN
分类号 H05K3/10;B05C5/00;B05C11/00;H01L21/027;H05K3/00 主分类号 H05K3/10
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