| 摘要 |
The present invention relates to a membrane system recycling waste hydrofluoric acid solution and a recycling method which recover hydrofluoric acid from waste hydrofluoric acid solution discharged in deposition, development, and etching processes of a process of manufacturing electronic products and semiconductors; properly cope with an emergency situation by automatically stopping equipment when the equipment is malfunctioned as all processes are automated; minimize fixed expenses of an etching company by recycling waste hydrofluoric acid solution which is necessarily generated in a display etching process; and minimize environmental pollution caused by hydrofluoric acid which is very harmful to an environment. [Reference numerals] (20) Water tank;(22) First membrane (MF membrane);(23) First membrane cleaning equipment (CIP);(24) First process tank;(26) Second membrane (MF membrane);(27) Second membrane cleaning equipment (CIP);(28) Second process tank;(30) First reservoir;(32') Filter press;(33) Second reservoir;(AA,EE,GG) Etching company;(BB) Recovery;(CC) Hydrofluoric acid waste liquid;(DD,JJ,MM) Concentrated water;(FF,HH) Supply;(II) Dewatering filtrate;(KK) Dehydration cake;(LL,NN) Charging process |
