METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE FILM WHERE MULTI-LAYER THIN FILM IS COATED, MULTI-LAYER THIN FILM TYPE TRANSPARENT CONDUCTIVE FILM PRODUCE BY THE SAME, AND MULTI-LAYER THIN FILM TYPE TRANSPARENT CONDUCTIVE FILM PRODUCING SYSTEM

摘要

The present invention relates a method for manufacturing a transparent conductive film on which a multilayered thin film is coated and a multilayered thin film type transparent conductive film manufactured by the same. The method for manufacturing the transparent conductive film includes the steps of coating a substrate or a film with an SiO2 layer including a first refractive index; sputtering a TiO2 layer including a second refractive index which is higher than the first refractive index on the coated SiO2 layer in a plasma vacuum state; sputtering a first AZO layer on the TiO2 layer; sputtering an Ag layer on the first AZO layer; and sputtering a second AZO layer on the Ag layer. [Reference numerals] (10) Pre-processing chamber;(20) Ion injecting chamber;(30) Sputtering chamber;(40) Uploading chamber