发明名称 |
Processo para eletrodeposição catódica de um material metálico selecionado em um substrato permanente ou temporário e microcomponente produzido por um processo de eletrodeposição de pulso |
摘要 |
The invention relates to a process for forming coatings or free-standing deposits of nanocrystalline metals, metal alloys or metal matrix composites. The process employs drum plating or selective plating processes involving pulse electrodeposition and a non-stationary anode or cathode. Novel nanocrystalline metal matrix composites and micro components are disclosed as well. Also described is a process for forming micro components with grain sizes below 1,000nm. |
申请公布号 |
BR0215787(B1) |
申请公布日期 |
2013.12.03 |
申请号 |
BR20020215787 |
申请日期 |
2002.06.25 |
申请人 |
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发明人 |
GINO PALUMBO;IAIN BROOKS;JONATHAN MCCREA;GLEEN D. HIBBARD;FRANCISCO GONZALEZ;KLAUS TOMANTSCHGER;UWE ERB |
分类号 |
C25D1/04;C25D5/02;C25D5/06;C25D5/18;C25D5/20;C25D7/04;C25D15/02;C25D17/00;C25D21/12 |
主分类号 |
C25D1/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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