| 摘要 |
PURPOSE: A dry film photo-resist is provided to operate an exposure process after removing a supporter film, and to prevent the bad effect of the exposure for improving the resolution. CONSTITUTION: A dry film photo-resist is formed by successively laminating a supporter film(20), a resin protective layer(30), and a photo-sensitive resin layer(40). The supporter film includes a releasing layer(10) on the opposite side from the surface for laminating the resin protective layer. The adhesive force between the releasing layer and the photo-sensitive layer is weaker than the adhesive force between the supporter film and the resin protective layer. |
