发明名称 |
Device manufacturing and cleaning method |
摘要 |
A method of manufacturing is disclosed. An exemplary method includes providing a substrate and forming one or more layers over the substrate. The method further includes forming a surface layer over the one or more layers. The method further includes performing a patterning process on the surface layer thereby forming a pattern on the surface layer. The method further includes performing a cleaning process using a cleaning solution to clean a top surface of the substrate. The cleaning solution includes tetra methyl ammonium hydroxide (TMAH), hydrogen peroxide (H2O2) and water (H2O). |
申请公布号 |
US8598042(B1) |
申请公布日期 |
2013.12.03 |
申请号 |
US201213486243 |
申请日期 |
2012.06.01 |
申请人 |
LU CHI-LUN;LIN KUAN-WEN;SHEN CHING-WEI;HSU TING-HAO;CHIN SHENG-CHI;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
LU CHI-LUN;LIN KUAN-WEN;SHEN CHING-WEI;HSU TING-HAO;CHIN SHENG-CHI |
分类号 |
H01L21/302 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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