发明名称 |
Pre-colored methodology of multiple patterning |
摘要 |
Some embodiments relate to a method for pre-coloring data within an integrated chip layout to avoid overlay errors that result from mask misalignment during multiple patterning lithography. The method may be performed by generating a graphical IC layout file containing an integrated chip layout having a plurality of IC shapes. The IC shapes within the graphical IC layout file are assigned a color during decomposition. The IC shapes are further pre-colored in a manner that deliberately assigns the pre-colored data to a same mask. During mask building data associated with IC shapes that have been pre-colored is automatically sent to a same mask, regardless of the colors that are assigned to the shapes. Therefore, the pre-colored shapes are not assigned to a masked based upon a decomposition, but rather based upon the pre-coloring. By assigning IC shapes to a same mask through pre-coloring, overlay errors can be reduced. |
申请公布号 |
US8601411(B2) |
申请公布日期 |
2013.12.03 |
申请号 |
US201213586177 |
申请日期 |
2012.08.15 |
申请人 |
CHEN YEN-HUEI;CHAN WEI MIN;LIAO HUNG-JEN;CHANG JONATHAN TSUNG-YUNG;TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHEN YEN-HUEI;CHAN WEI MIN;LIAO HUNG-JEN;CHANG JONATHAN TSUNG-YUNG |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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