| 摘要 |
A slit nozzle is relatively moved by a nozzle elevating device and a nozzle slide device against a substrate which is horizontally maintained by a spin chuck. The development processing of the substrate is performed as a developer is discharged from the outlet of the slit nozzle. After the discharge of the developer, the slit nozzle is moved to a standby position except the upper part of the substrate which is maintained by a spin chuck. The slit nozzle is cleaned by a cleaning solution with bubbles on a standby pod installed on the standby position. [Reference numerals] (702) Bubble entrained device;(703) Cleaning fluid supplying source;(704) Gas supply source;(705) Suction device;(80) Control unit |
