| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus with a non-contact floating conveyance function which can convey a substrate without touching the lower surface of the substrate and which can process both upper and lower surfaces or only the lower surface of the substrate without causing the contamination of the substrate or roller tracks while transferring the substrate at high speed and stably. SOLUTION: A substrate processing apparatus with a plurality of substrate processing units 7, 8, and 9 for performing any one processing of cleansing treatment by water, chemical treatment by a chemical solution, rinse treatment by water and drying treatment by gas such as air or nitrogen gas on both the upper and lower surfaces of the substrate or on only the lower surface is provided with a plurality of substrate flotation units 10 for injecting a fluid such as water, a chemical solution, air or nitrogen gas to the lower surface of a substrate 1 so as to float the substrate 1 and holding the position without touching the lower surface of the substrate 1, and a substrate conveyance unit having a plurality of conveyance rollers 12 for touching edge parts at both sides of the substrate 1 in a horizontal direction to transfer the substrate 1. COPYRIGHT: (C)2012,JPO&INPIT |
