| 摘要 |
<p>OF THE DISCLOSUREMETHOD AND APPARATUS FOR LIQUID TREATMENT OF WAFER-SHAPED ARTICLES5An in-line mixing system provides a process liquid for treatment of wafer-shaped articles. The system comprises a first flow regulator configured to regulate flow of a first liquid stream, a second flow regulator configured to10 regulate flow of a second liquid stream having a chemical component, a refractive index meter configured to provide a refractive index measurement of a mixture of the first and second liquid streams, a combined flow meter configured to provide a combined flow measurement of the mixture of the15 first and second liquid streams, and an automatic controller. The automatic controller is configured to operate the first and second flow regulators based upon the refractive index measurement and the combined flow measurement.20Fig. 1</p> |
