Lithography system has cooling element which is spaced apart and in surface contact with optical element in first and second actuator positions of actuator

摘要

The lithography system (10) has cooling device (50) to cool optical element (40) with cooling element. An actuator moves cooling element and optical element in relative to one another. The cooling element in a first actuator position of the actuator is spaced apart from the optical element, and in a second actuator position of the actuator is in surface contact with the optical element.