发明名称 A NON-UNIFORM LATERAL PROFILE OF TWO-DIMENSIONAL ELECTRON GAS CHARGE DENSITY IN TYPE III NITRIDE HEMT DEVICES USING ION IMPLANTATION THROUGH GRAY SCALE MASK
摘要 A high electron mobility field effect transistor (HEMT) includes a two dimensional electron gas (2DEG) in the drift region between the gate and the drain that has a non-uniform lateral 2DEG distribution that increases in a direction in the drift region from the gate to the drain.
申请公布号 US2013313611(A1) 申请公布日期 2013.11.28
申请号 US201213478402 申请日期 2012.05.23
申请人 KHALIL SAMEH;BOUTROS KARIM S.;HRL LABORATORIES, LLC 发明人 KHALIL SAMEH;BOUTROS KARIM S.
分类号 H01L29/778;H01L21/338 主分类号 H01L29/778
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