发明名称 |
Method and system for supplying a cleaning gas into a process chamber |
摘要 |
A method and apparatus for cleaning a process chamber are provided. In one embodiment, a process chamber is provided that includes a remote plasma source and a process chamber having at least two processing regions. Each processing region includes a substrate support assembly disposed in the processing region, a gas distribution system configured to provide gas into the processing region above the substrate support assembly, and a gas passage configured to provide gas into the processing region below the substrate support assembly. A first gas conduit is configured to flow a cleaning agent from the remote plasma source through the gas distribution assembly in each processing region while a second gas conduit is configured to divert a portion of the cleaning agent from the first gas conduit to the gas passage of each processing region.
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申请公布号 |
US8591699(B2) |
申请公布日期 |
2013.11.26 |
申请号 |
US201213676820 |
申请日期 |
2012.11.14 |
申请人 |
SANKARAKRISHNAN RAMPRAKASH;DU BOIS DALE R.;BALASUBRAMANIAN GANESH;JANAKIRAMAN KARTHIK;ROCHA-ALVAREZ JUAN CARLOS;NOWAK THOMAS;SIVARAMAKRISHNAN VISWESWAREN;M'SAAD HICHEM;APPLIED MATERIALS, INC. |
发明人 |
SANKARAKRISHNAN RAMPRAKASH;DU BOIS DALE R.;BALASUBRAMANIAN GANESH;JANAKIRAMAN KARTHIK;ROCHA-ALVAREZ JUAN CARLOS;NOWAK THOMAS;SIVARAMAKRISHNAN VISWESWAREN;M'SAAD HICHEM |
分类号 |
C23F1/00;H01L21/306 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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