发明名称 Liquid processing apparatus
摘要 A liquid processing apparatus processes a lower surface and a side surface of an object to be processed W. The liquid processing apparatus includes: a process-liquid supply mechanism configured to supply a process liquid to the object to be processed; a drain mechanism configured to drain the process liquid having processed the object to be processed W; a rotational cup disposed circumferentially outward the object to be processed W, the rotational cup being configured to guide the process liquid having processed the object to be processed W to the drain mechanism; and a driving part configured to rotate the rotational cup. The rotational cup is provided with a support part that projects circumferentially inward so as to support a circumferential part of the object to be processed W.
申请公布号 US8590547(B2) 申请公布日期 2013.11.26
申请号 US20090506506 申请日期 2009.07.21
申请人 HIGASHIJIMA JIRO;NAMBA HIROMITSU;TOKYO ELECTRON LIMITED 发明人 HIGASHIJIMA JIRO;NAMBA HIROMITSU
分类号 B08B3/10 主分类号 B08B3/10
代理机构 代理人
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