发明名称 |
Liquid processing apparatus |
摘要 |
A liquid processing apparatus processes a lower surface and a side surface of an object to be processed W. The liquid processing apparatus includes: a process-liquid supply mechanism configured to supply a process liquid to the object to be processed; a drain mechanism configured to drain the process liquid having processed the object to be processed W; a rotational cup disposed circumferentially outward the object to be processed W, the rotational cup being configured to guide the process liquid having processed the object to be processed W to the drain mechanism; and a driving part configured to rotate the rotational cup. The rotational cup is provided with a support part that projects circumferentially inward so as to support a circumferential part of the object to be processed W.
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申请公布号 |
US8590547(B2) |
申请公布日期 |
2013.11.26 |
申请号 |
US20090506506 |
申请日期 |
2009.07.21 |
申请人 |
HIGASHIJIMA JIRO;NAMBA HIROMITSU;TOKYO ELECTRON LIMITED |
发明人 |
HIGASHIJIMA JIRO;NAMBA HIROMITSU |
分类号 |
B08B3/10 |
主分类号 |
B08B3/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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