RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND COMPOUND

摘要

Provided is a resist composition in which acid is generated with exposure, and the solubility in a developer changes with the action of acid. The resist composition is characterized in comprising a base component (A) in which the solubility in a developer changes with the action of acid, wherein the base component (A) includes a polymer compound (A1) having a composition unit (a0) represented by equation (a0) [A" is 1-5 carbon alkylene which may contain oxygen atom or sulfur atom, oxygen atom or sulfur atom, R^1 is a cyclic functional group containing lactone or -SO2- or carbonate, and W^2 is a functional group formed by a polymerization reaction from a polymerizable functional group].