PHOTO MASK BLANK MANUFACTURING METHOD, PHOTO MASK BLANK, PHOTO MASK, AND PATTERN TRANSFER METHOD

摘要

The purpose of the present invention is to provide a manufacture technology of a functional layer that has a small variation of optical density, low defect, high quality, and high etching speed. To solve the problems, a method for manufacturing a photo mask blank includes a chrome-based material including metal element at a temperature of 400 or less at which the mixture of the functional layer and a chrome element is melted when manufacturing the photo mask blank having at least one functional layer on a transparent substrate. During the process for forming the functional layer, a sputtering process (Co-Sputtering) is performed on a chrome target (target A) and a target (target B) made of at least one kind of a metal element as the main element together. Instead of using target A or target B, one kind of target or two kinds of the targets are used.