ABSOLUTE POSITION MEASURING METHOD, ABSOLUTE POSITION MEASURING APPARATUS, AND SCALE

摘要

The present invention relates to an absolute position measuring method, an absolute position measuring apparatus, and a scale. The scale includes a scale pattern which is formed to replace a Pseudo random code, where linear feedback cloth at an N stage is repeatedly placed with the sequence of a register, using a first symbol for indicating a first state with a first width and a second symbol for indicating a second state with the first width. The first symbol is divided into at least two first symbol areas, and the second symbol is divided into at least two second symbol areas. In addition, at least one overlapping area exists with the same structure due to overlapping between the first symbol and the second symbol.