| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of an MEMS optical scanner capable of accurately controlling an etching shape by stabilizing a temperature of a silicon substrate when constructing a silicon structure by dry-etching a front surface of the silicon substrate having a rear surface on which a cavity is formed.SOLUTION: The manufacturing method comprises: a step of forming the cavity on the rear surface of the silicon substrate 60 by etching; and a step of sticking a protective sheet 80 on the rear surface of the silicon substrate 60 after formation of the cavity, and forming silicon structures 70, 71, 72 on the front surface of the silicon substrate 60 by dry etching. A needle hole 81 is formed in advance on the protective sheet 80 correspondingly to the cavity, and in the step of forming the silicon structures 70, 71, 72, a cooling gas, which is supplied from the rear side of the silicon substrate 60 through the needle hole 81, is brought in contact with a silicon layer on the front surface of the silicon substrate 60. |
