| 摘要 |
A silicon nitride sintered body, wherein in a silicon nitride substrate consisting of crystal grains of beta-type silicon nitride and a grain boundary phase containing at least one type of rare earth element (RE), magnesium (Mg) and silicon (Si), the grain boundary phase consists of an amorphous phase and a MgSiN2 crystal phase. The X-ray diffraction peak intensity of any crystal plane of a crystal phase containing the rare earth element (RE) is less than 0.0005 times the sum of the diffraction peak intensities of (110), (200), (101), (210), (201), (310), (320) and (002) of the crystal grains of the beta-type silicon nitride; and the X-ray diffraction peak intensity of (121) of the MgSiN2 crystal phase is 0.0005 to 0.003 times the sum of the X-ray diffraction peak intensities of (110), (200), (101), (210), (201), (310), (320) and (002) of the crystal grains of the beta-type silicon nitride.
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