APPARATUS FOR PROCESSING SUBSTRATE

摘要

The present invention relates to a substrate treatment device comprising: a chamber with an inner space; a treatment container which is installed in the inner space of the chamber and provides a space for washing a substrate inside; a substrate support member which is provided in the space of the treatment container and supports the substrate; a horizontal partition wall which divides the inner space of the chamber except for the treatment container into an upper region and a lower region; and a perforated plate which is separated from the upper surface of the horizontal partition wall and has holes to discharge air around the treatment container.