METHOD AND DEVICE FOR MEASURING TEMPERATURE OF SUBSTRATE IN VACUUM PROCESSING APPARATUS

摘要

Disclosed are a method and a device for determining the temperature of a substrate in a vacuum processing device during a process for manufacturing the substrate. The method for determining the temperature of a substrate in a vacuum processing device by the present invention comprises the steps of: disposing a substrate to be measured on a susceptor of a vacuum processing device for a manufacturing process and selecting i wavelengths from radiance emitted from the susceptor and passing through the substrate, where i is a natural number greater than 1; and obtaining the temperature of the substrate based on the i radiances and the i wavelengths by using a mathematical equation. The substrate temperature measuring mechanism of the present invention has high accuracy and high reliability. [Reference numerals] (AA) Start;(BB) End;(S1) Selecting i wavelengths from radiance emitted from the susceptor and passing through the substrate, where i is a natural number greater than 1;(S2) Obtaining at least one radiance corresponding to selected i wavelength;(S3) Calculating temperature of substrate based on i radiance and i wavelength, using the following mathematical equation